Deposition of Nanocrystalline Multilayer Graphene Using Pulsed Laser Deposition

نویسندگان

چکیده

The wide application of graphene in the industry requires direct growth films on silicon substrates. In this study, we found a possible technique to meet requirement above. Multilayer thin (MLG) were grown without catalyst Si/SiO2 using pulsed laser deposition (PLD). It was that minimum number pulses required produce fully covered (uninterrupted) samples is 500. This resulted contain ~5 layers graphene. not affected by fluence and sample cooling rate after deposition. However, increase from 0.9 J/cm2 1.5 2.5-fold reduction MLG resistance. present study reveals PLD method suitable nanocrystalline multilayer with electrical conductivity same magnitude as commercial CVD samples.

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ژورنال

عنوان ژورنال: Crystals

سال: 2023

ISSN: ['2073-4352']

DOI: https://doi.org/10.3390/cryst13060881